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US Patent Issued to Georgia Tech Research on June 23 for "System and method to control defects in projection-based sub-micrometer additive manufacturing" (Georgia Inventor)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,722, issued on June 23, was assigned to Georgia Tech Research Corp. (Atlanta). "System and method to control defects in projection-based su... और पढ़ें


US Patent Issued to FUJIFILM on June 23 for "Washout processor and washing method" (Japanese Inventor)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,723, issued on June 23, was assigned to FUJIFILM Corp. (Tokyo). "Washout processor and washing method" was invented by Masato Shirakawa (Ha... और पढ़ें


US Patent Issued to Taiwan Semiconductor Manufacturing on June 23 for "Lithography system with non-invasive monitoring and methods" (Taiwanese Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,724, issued on June 23, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan). "Lithography system with non-invasiv... और पढ़ें


US Patent Issued to ASML Netherlands on June 23 for "Methods and systems to calibrate reticle thermal effects" (Dutch Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,725, issued on June 23, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands). "Methods and systems to calibrate reticle thermal e... और पढ़ें


US Patent Issued to ASML NETHERLANDS, CYMER on June 23 for "Optimization of lithographic process based on bandwidth and speckle" (Dutch, American Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,726, issued on June 23, was assigned to ASML NETHERLANDS B.V. (Veldhoven, Netherlands) and CYMER LLC (San Diego). "Optimization of lithogra... और पढ़ें


US Patent Issued to ASML Netherlands on June 23 for "Method for correcting measurements in the manufacture of integrated circuits and associated apparatuses" (Dutch, Belgian Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,727, issued on June 23, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands). "Method for correcting measurements in the manufact... और पढ़ें


US Patent Issued to KLA on June 23 for "Oblique illumination for overlay metrology" (Israeli, American Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,728, issued on June 23, was assigned to KLA Corp. (Milpitas, Calif.). "Oblique illumination for overlay metrology" was invented by Andrew V... और पढ़ें


US Patent Issued to ASML Netherlands on June 23 for "On chip sensor for wafer overlay measurement" (Dutch, American Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,729, issued on June 23, was assigned to ASML Netherlands B.V. (Veldhoven, Netherlands). "On chip sensor for wafer overlay measurement" was ... और पढ़ें


US Patent Issued to Onto Innovation on June 23 for "Front-to-back overlay (FTBO) standard" (New Hampshire, New Jersey, Massachusetts Inventors)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,730, issued on June 23, was assigned to Onto Innovation Inc. (Wilmington, Mass.). "Front-to-back overlay (FTBO) standard" was invented by K... और पढ़ें


US Patent Issued to CANON on June 23 for "Exposure apparatus, exposure method, and article manufacturing method" (Japanese Inventor)

ALEXANDRIA, Va., July 15 -- United States Patent no. 12,663,731, issued on June 23, was assigned to CANON K.K. (Tokyo). "Exposure apparatus, exposure method, and article manufacturing method" was inv... और पढ़ें